WANG Lifu ¹,Hu Yuehui ¹ ,ZHANG Xiangwen ¹ ,CHEN guanghua ² ,QU Minghao ¹ ,XIE Yaojiang ¹

(1. Jingdezhen Ceramic Institute, Jingdezhen 333001; 2. Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022)

Abstracts: In this article, using UV-visible transmission spectrum technology to calculate the fitting thickness of every position on the film we investigated the thickness unevenness and using transmission spectrum and width of IR absorption peaks technology we studied the structure unevenness. It was found that the uneven ECR zone and magnetic field gradient are the primary factors affecting the uniformity of films for the single magnetic field coil MWECR CVD system. By adopting the way of improving the rectangle -coupling waveguide and decreasing magnetic field coil current, under the hot -wire -assisted system, we deposited the a-Si:H films with thickness uniformity of less than 3.5% above the substrate whose diameter is 6cm.

Keywords: HW-MWECR deposition system, evenness, hydrogenated amorphous silicon films