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Effect of Sputtering Time of Graphite Target on Properties of Ta-C Coating

HUANG Biao, ZHANG Ergeng, ZHOU Qiong, CHEN Yongkang
(Shanghai Engineering Research Center of Physical Vapor Deposition (PVD) Superhard Coating and Equipment, Shanghai Institute of Technology,Shanghai 201418, China)

Abstract: The work aims to study the effect of sputtering time of graphite target on the properties of Ta-C coating prepared by pulsed magnetron sputtering on cemented carbide (YG10). The SEM, nanoindentation and Raman spectrometer were used to analyze the surface morphology, hardness and ratio of sp3to sp2, then three time points were chosen to deposit Ta-C coating on the milling cutter for dry-type milling of 2A50 aluminum alloy. The advantages and disadvantages of Ta-C coating were observed. The results show with the increase of sputtering time from 40-80 min, the surface morphology, hardness, sp3 content and cutting performance of Ta-C coating increased first and then decreased. The Ta-C coating prepared by sputtering for 55 min has the best properties: the hardness reached 86.9 GPa and the sp3 content was relatively high. Thus, the surface morphology, hardness and the ratio of sp3 to sp2 of Ta-C coating prepared by graphite target sputtering for different time are quite different. It is very important to select the suitable sputtering time to prepare Ta-C coating. In this study, the Ta-C coating prepared by graphite target sputtering for 55 min has the best performance, the longest service life and the best cutting performance.
Key words: Ta-C coating; diamond-like carbon coating; surface morphology; hardness; friction and wear; cutting performance

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