PAN Fei, WANG Jianbin, XU Huimin, YAO Jinjie, WANG Qiaoyu
(School of Mechanical Engineering, Anhui Polytechnic University, Wuhu 241000, Anhui, China)

Abstract: As a new semiconductor material, aluminum nitride ceramics have the characteristics of ultra wide band gap, high thermal conductivity, thermal expansion coefficient matching with silicon, excellent electrical properties (low dielectric constant, good dielectric loss), good mechanical properties, non toxicity, fast optical transmission speed, etc. They are ideal materials for preparing high-performance ceramic substrates and packaging. The basic structure and performance characteristics of aluminum nitride are summarized. The current application fields and application prospects of aluminum nitride ceramic materials are described. The current research status of ultra precision machining at home and abroad is described in detail. Several common surface processing methods, such as chemical mechanical polishing, magnetorheological polishing, ELID grinding and plasma assisted polishing, are summarized. Nano level smooth surfaces are obtained. The future development direction of aluminum nitride ceramic precision machining is prospected.
Key words: aluminum nitride; ceramic crystal structure; ultra precision machining