XIE  Yaojiang ¹ HUYuehui ¹ XIAO Renxian ¹ CHEN  Guanghua ² XU Haijun ¹ CHEN  Yichuan ¹ WANG  Lifu ¹

(1 Jingdezhen Ceramics Institution, Jingdezhen Jiangxi 333403, China; 2 Department of Material Science and Engineering,

Beijing University of Technology, Beijing 100022, China)

Abstract:The microcrystalline silicon films in the phase transition regime from amorphous to microcrystalline were fabricated by microwave electron-cyclotron-resonance chemical vapor deposition (MWECR CVD) system. The influence of deposition temperature and deposition pressure on the structure and electrical properties of microcrystalline silicon films was investigated. It is shown that the films in the phase transition regime are easier to fabricate under the condition of lower deposition pressure and higher substrate temperature.

Keywords:MWECR CVD system, crystalline volume fraction, amorphous silicon based solar cells