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​Chemical Vapor-Deposited Preparation and Properties of Silicon Nitride Thin Film

YANG Hui, MA Qingsong, GE Manzhen

(Zhejiang University)

Abstract:Silicon nitride thin film is a kind of very important thin film with excellent photoelectric, passivation and me-chanical properties. It will been applied widely in microelectronics, photoeleutrons and surface modification fields. Inthis paper, we review emphasizedly several chemical vapour deposition methods and some properties of silicon nitridethin film.

Keywords: silicon nitride, thin film, chemical vapor deposition, properties


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