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The Influence of Annealing Temperature on ZnO:Al Thin Film Prepared by Sol-Gel Method

GUO Shengli, HU Yuehui, HU Keyan, CHEN Yichuan, LIU Ximei, XU Bin, ZHANG Zhiming

(School of Mechanical and Electrical Engineering, Jingdezhen Ceramic Institute, Jingdezhen 333403, Jiangxi, China)

Abstract:The ZnO:Al thin films were deposited on the quartz glass substrates by sol-gel spray-spin coating technique. Then the three thin films were annealed in air at 450 °C, 550 °C and 650 °C, respectively. The influence of annealing temperatures on the morphology,grain size, transmission spectrum and PL of the films were detected by scanning electron microscopy, X-ray diffraction (XRD), UV-Vis spectrophotometer and photoluminescence spectroscopy respectively. The results showed that the films had hexagonal wurtzite-structured grains, exhibited C-axis preferred orientation and the average transmittance were found to be over 90% in the visible region. As the annealing temperature increased, the (002) peaks strengthened, the grain sizes became bigger, the PL intensity increased and the band of ultraviolet emission shifted to short wavelength.

Key words:ZnO thin film; sol-gel; annealing temperature; optical property


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