XIA Guofeng, YANG Xuefeng, WANG Shouren, WAN Zhuang, LIU Wenbo, LI Dan
(University of Jinan, School of Mechanical Engineering, Jinan 250022, Shandong, China)
Abstract: WS2 coating and metal target Zr were prepared by RF magnetron sputtering and DC magnetron sputtering. WS2/Zr composite coating was prepared on YT15 cemented carbide substrate. The surface morphology and cross-section of the WS2/Zr composite coating were analyzed by scanning electron microscopy. The composition of the composite coating and the content of each deposited particle were detected by energy dispersive spectroscopy (EDS) and observed by X-ray diffraction (XRD). The crystal structure of the composite coating was grown, and the thickness of the coating, the microhardness and the bond between the coating and the substrate were tested to investigate the effect of the variation of the sputtering power of the WS2 target on the performance of the coating. The results show that when the sputtering power of WS2 target is controlled at 90 W, the prepared WS2/Zr composite coating has the most compact structure and the crystal refinement trend. The growth of grain structure is the typical growth orientation of typical WS2 crystal. The thickness, microhardness, and adhesion of the coating to the substrate prepared at this time were about 4.8 μm, HV630, and 67 N, respectively.
Key words: drawing die; WS2 soft coating; magnetron sputtering; WS2/Zr composite coating