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Preparation of ZrSiO4 thin Film via Sol-Gel Method

ZHA Jianrui 1, CHEN Ting 1, 2, JIANG Weihui 1, 2, LIU Jianmin 2, ZHANG Xiaojun 1, HU Qing 1
(1. School of Material Science and Engineering, Jingdezhen Ceramic Institute, Jingdezhen 333403, Jiangxi, China;
2. National Engineering Research Center for Domestic & Building Ceramics, Jingdezhen 333001, Jiangxi, China)

Abstract: Zirconium silicate (ZrSiO4) film was prepared on n-type silicon substrate via sol-gel method with nitric acid catalysis. The effect of gelation process, such as nitric acid catalysis, reflux and ageing on the phase composition and the microstructure of the thin film was studied by means of X-ray diffraction patterns (XRD) and scanning electron microscopy (SEM), respectively. Meanwhile, the stability of sol was identified by time-viscosity curves and the hydrolytic polycondensation process was investigated by Fourier transform infrared (FTIR) spectrum. The experimental results indicated that compared to reflux and ageing processes, the introduction of nitric acid to adjust the pH value to 1 was favorable to achieve the stable ZrSiO4 sol, because the hydrolytic polycondensation of tetraethoxysilane slowed down. A dense and smooth ZrSiO4 film was achieved through dip coating and then heat treatment at 900 ℃ for 0.5 h, which can effectively prevent the NaOH alkali corrosion on monocrystalline silicon substrate.

Key words: film; zirconium silicate; sol-gel method; pH value; corrosion resistance properties

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